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SetID | 1291 |
SubSetOf | 0 |
SubSetOrg | |
Area | 119 |
SubRegion | 0 |
Code | R14 |
Type | a |
Design | |
Perf | 11½ |
Paper | |
Gum | clear |
Printer | |
Printing | Photogravure |
Designer | Li Dawei, Zhang Kerang, Yang Baizi, Xu Yanbo |
Engineer | |
Qty | 0 |
Issued | 19710925 |
Exact | Y |
SetName | Regular Issue with Designs of Revolutionary Monuments (3rd Print) |
ShortName | Revolutionary Monuments (3rd) |
InYearBook | |
InSet | 11 |
Sht | 0 |
MS | 0 |
Bklt | 0 |
Face | |
Comments | set of 11 |
PicAspect | 0.428 |
SG | 2455-65 |
Ma | |
Scott | 1019//36 |
Chan | |
Mi | 1083-93 |
Yang | |
Yvert | |
OptOn | 0 |
Wmk | |
DesignSize | |
StampSize | 27½x22 |
SheetSize | |
Mint | 23 |
Used | 7 |